DocumentCode
1723251
Title
A statistically optimal macromodeling framework with application in process variation analysis of MEMS devices
Author
Wu, Bin
Author_Institution
One AMD Place, Adv. Micro Devices Inc., Sunnyvale, CA, USA
fYear
2012
Firstpage
221
Lastpage
224
Abstract
Macromodels are used extensively in circuit and process analysis for higher computation efficiency, and better insight into system behaviors. A statistically optimal and elegant framework for macro-modeling is proposed in this paper, which can successfully handle the modeling challenges created by the highly customized fabrication/design paradigm of MEMS devices. Without requirements for a priori knowledge and experience of fast emerging and highly diversified MEMS fabrication and design style, the proposed framework can adapt to arbitrary distribution and correlation by optimally scaling the order and dimension of the process variation models for trade-off between accuracy and efficiency. The effectiveness of the proposed framework is demonstrated by process variation modeling and analysis of MEMS devices.
Keywords
microfabrication; micromechanical devices; network analysis; statistical analysis; MEMS devices; computation efficiency; highly diversified MEMS design style; highly diversified MEMS fabrication; optimally scaling correlation; optimally scaling distribution; process variation analysis; statistically optimal macromodeling framework; Estimation; Fabrication; Integrated circuit modeling; Micromechanical devices; Polynomials; Principal component analysis; Vectors;
fLanguage
English
Publisher
ieee
Conference_Titel
New Circuits and Systems Conference (NEWCAS), 2012 IEEE 10th International
Conference_Location
Montreal, QC
Print_ISBN
978-1-4673-0857-1
Electronic_ISBN
978-1-4673-0858-8
Type
conf
DOI
10.1109/NEWCAS.2012.6328996
Filename
6328996
Link To Document