DocumentCode
1724473
Title
ASMC 2011 — Table of contents
fYear
2011
Firstpage
1
Lastpage
7
Abstract
The following topics are dealt with: factory optimisation; advanced metrology; advanced equipment; advanced process development; advanced process control; advanced lithography; wafer defect inspection; yield optimization and data management.
Keywords
crystal defects; data mining; lithography; optimisation; process control; semiconductor industry; wafer-scale integration; advanced equipment; advanced lithography; advanced metrology; advanced process control; advanced process development; data management; factory optimisation; wafer defect inspection; yield optimization;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI
Conference_Location
Saratoga Springs, NY
ISSN
1078-8743
Print_ISBN
978-1-61284-408-4
Type
conf
DOI
10.1109/ASMC.2011.5898158
Filename
5898158
Link To Document