Title :
ASMC 2011 — Table of contents
Abstract :
The following topics are dealt with: factory optimisation; advanced metrology; advanced equipment; advanced process development; advanced process control; advanced lithography; wafer defect inspection; yield optimization and data management.
Keywords :
crystal defects; data mining; lithography; optimisation; process control; semiconductor industry; wafer-scale integration; advanced equipment; advanced lithography; advanced metrology; advanced process control; advanced process development; data management; factory optimisation; wafer defect inspection; yield optimization;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI
Conference_Location :
Saratoga Springs, NY
Print_ISBN :
978-1-61284-408-4
DOI :
10.1109/ASMC.2011.5898158
