• DocumentCode
    1724812
  • Title

    Reproducibility in plasma polymerized methane films as determined by contact electrification measurements

  • Author

    Burkett, S.L. ; Charlson, E.M. ; Charlson, E.J. ; Yasuda, H.K.

  • Author_Institution
    Coll. of Eng., Missouri Univ., Columbia, MO, USA
  • fYear
    1992
  • Firstpage
    391
  • Lastpage
    396
  • Abstract
    The problem of charge variability has been resolved for plasma polymer films on silicon substrates using the contact-separation technique. Charge measurements demonstrated that variability in contact charging on samples deposited simultaneously is much lower than previously reported. The progress in this area is believed to be due to the fact that the films are uniform in thickness and are deposited on smooth substrates with controlled and reproducible deposition conditions. The effect of postdeposition ambient on the stability of film properties was also studied by monitoring the electrical properties over time with the contact-separation measurement. A postdeposition oxygen soak was found to minimize the changes in electrical parameters
  • Keywords
    charge measurement; ellipsometry; plasma deposited coatings; polymer films; semiconductor-insulator boundaries; static electrification; thickness measurement; Si; charge measurements; charge variability; contact electrification measurements; contact-separation technique; electrical parameters; electrical properties; plasma polymerized methane films; postdeposition ambient; postdeposition oxygen soak; reproducible deposition conditions; smooth substrates; Charge measurement; Contacts; Electric variables measurement; Plasma measurements; Polymer films; Reproducibility of results; Silicon; Stability; Substrates; Thickness control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena, 1992. Annual Report. Conference on
  • Conference_Location
    Victoria, BC
  • Print_ISBN
    0-7803-0565-5
  • Type

    conf

  • DOI
    10.1109/CEIDP.1992.283220
  • Filename
    283220