Title :
A technique for depositing metal layers over large areas for EMI shielding
Author_Institution :
Div. of Laser & Plasma Technol., Bhabha Atomic Res. Centre, Bombay, India
Abstract :
Shielding by metal enclosures are now used routinely to guard against electromagnetic fields. The mechanism responsible for shielding in such enclosures is easy to understand-reflection and absorption. Whereas the mechanism is simple, the implementation of this idea is rarely a simple task. Given the variety of geometries, fields and shield materials, one is forced to innovate. Thus, novel solutions towards construction of electromagnetic shield enclosures are sought. This paper presents the merits and demerits of a method that can be used to obtain metallic shields
Keywords :
coating techniques; electromagnetic interference; electromagnetic shielding; materials preparation; metallic thin films; EMI shielding; Faraday cage; absorption; depositing metal layers; electromagnetic fields; electromagnetic shield enclosures; mechanism; metal enclosures; metallic shields; reflection; thin films; Atherosclerosis; Chemical vapor deposition; Electromagnetic fields; Electromagnetic interference; Electron beams; Geometry; Sheet materials; Substrates; Thermal spraying; Transistors;
Conference_Titel :
Electromagnetic Interference and Compatibility, 1995., International Conference on
Conference_Location :
Madras
Print_ISBN :
0-7803-3229-6
DOI :
10.1109/ICEMIC.1995.501604
