• DocumentCode
    1725373
  • Title

    Establishing continuous flow manufacturing in a Wafertest-environment via value stream design

  • Author

    Keil, Sophia ; Schneider, Germar ; Eberts, Dietrich ; Wilhelm, Kristina ; Gestring, Ingo ; Lasch, Rainer ; Deutschländer, Arthur

  • Author_Institution
    Dept. of Autom., Wafertest & Line Control, Infineon Technol. Dresden GmbH, Dresden, Germany
  • fYear
    2011
  • Firstpage
    1
  • Lastpage
    7
  • Abstract
    “Learning to see” is the message of the powerful Value Stream Mapping (VSM) technique, which was developed within the lean production paradigm to help practitioners redesign production systems, eliminate waste and create continuous flow manufacturing in a high-mix, low-volume manufacturing environment. It was originally developed mainly for disconnected flow lines of the automotive industry. In this contribution, both the adaption of this method to the characteristics of semiconductor manufacturing and its application in a Wafertest environment at Infineon Technologies, an important frontend site for microcontroller manufacturing, are shown. The article provides guidelines on how to implement continuous flow manufacturing into typical semiconductor production areas. The advantages of this production principle, as well as the special expenditures during the implementation, are demonstrated.
  • Keywords
    design for manufacture; integrated circuit manufacture; lean production; microcontrollers; Infineon technologies; automotive industry; continuous flow manufacturing; lean production paradigm; microcontroller manufacturing; production systems; semiconductor production; value stream design; value stream mapping; wafertest-environment; Automotive engineering; Business; Convergence; Logic gates; Manufacturing; Materials; Production; Value Stream Design; Wafertest; continuous flow manufacturing; high-mix; job shop; low-volume; semiconductor industry;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI
  • Conference_Location
    Saratoga Springs, NY
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-61284-408-4
  • Electronic_ISBN
    1078-8743
  • Type

    conf

  • DOI
    10.1109/ASMC.2011.5898196
  • Filename
    5898196