DocumentCode :
1725417
Title :
Reducing environmentally induced defects while maintaining productivity
Author :
van Roijen, R. ; Conti, S. ; Keyser, R. ; Arndt, R. ; Burda, R. ; Ayala, J. ; Henry, R. ; Levy, J. ; Maxson, J. ; Meyette, E. ; Steer, W. ; Tabakman, K. ; Yu, C.
Author_Institution :
IBM Syst. & Technol., Hopewell Junction, NY, USA
fYear :
2011
Firstpage :
1
Lastpage :
5
Abstract :
In Semiconductor manufacturing we expect the cause of defects to be process or tool related. However, at recent technology nodes we find that defects can be caused by issues related to the wafers environment, such as processing of other wafers in the same tool or in the same carrier, or by seemingly innocuous actions. One result is the rapid proliferation of queue time restrictions and batching rules. In this work we show defects which are caused by the environment and several ways to reduce the sensitivity to environmental factors. Process and tool changes are found to eliminate yield detractors. We also present a work around that has helped to reduce the impact of queue time restrictions on cycle time.
Keywords :
maintenance engineering; productivity; semiconductor device manufacture; cycle time restriction; environmental factors sensitivity reduction; environmentally induced defect; maintenance productivity; queue time impact reduction; queue time restriction; rapid proliferation; semiconductor manufacturing; wafer environment; yield detractors elimination; Contamination; Epitaxial growth; Lithography; Logic gates; Productivity; Silicon germanium; Surface treatment; contamination; defect; defect classification; foreign material; queue time;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI
Conference_Location :
Saratoga Springs, NY
ISSN :
1078-8743
Print_ISBN :
978-1-61284-408-4
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2011.5898199
Filename :
5898199
Link To Document :
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