DocumentCode
1725532
Title
a-Si thin film transistors using dilute-gas plasma-enhanced chemical vapor deposition
Author
Wright, S.L. ; Rothwell, M.B. ; Souk, J.H. ; Kuo, Y.
Author_Institution
IBM Thomas J. Watson Research Center
fYear
1993
fDate
6/15/1905 12:00:00 AM
Firstpage
107
Lastpage
108
Keywords
Chemical vapor deposition; Displays; Insulation; Metal-insulator structures; Plasma chemistry; Plasma materials processing; Process design; Thin film transistors; Vehicle safety; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 1993. 51st Annual
Type
conf
DOI
10.1109/DRC.1993.1009602
Filename
1009602
Link To Document