• DocumentCode
    1725636
  • Title

    Current status of failure analysis for ULSIs

  • Author

    Nakajima, Shigeru ; Ueki, Takemi ; Shionoya, Y. ; Mafune, K. ; Kuji, Norio ; Nakamura, Shinji ; Komine, Y. ; Takeda, T.

  • Author_Institution
    Dept. of NTT, Electroncs Technol. Corp., Kanagawa, Japan
  • Volume
    2
  • fYear
    1997
  • Firstpage
    591
  • Abstract
    Today, failure analysis is essential for developing process technologies and for improving reliability and yield of LSIs. To show current status of failure analysis, recent progress of failure analysis techniques and several case study results in our companies are described
  • Keywords
    ULSI; failure analysis; integrated circuit reliability; ULSI; failure analysis; Atomic force microscopy; Electron beams; Failure analysis; Magnetic force microscopy; Optical beams; Optical imaging; Optical microscopy; Scanning electron microscopy; Transmission electron microscopy; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 1997. Proceedings., 1997 21st International Conference on
  • Conference_Location
    Nis
  • Print_ISBN
    0-7803-3664-X
  • Type

    conf

  • DOI
    10.1109/ICMEL.1997.632912
  • Filename
    632912
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1725636