Title :
Current status of failure analysis for ULSIs
Author :
Nakajima, Shigeru ; Ueki, Takemi ; Shionoya, Y. ; Mafune, K. ; Kuji, Norio ; Nakamura, Shinji ; Komine, Y. ; Takeda, T.
Author_Institution :
Dept. of NTT, Electroncs Technol. Corp., Kanagawa, Japan
Abstract :
Today, failure analysis is essential for developing process technologies and for improving reliability and yield of LSIs. To show current status of failure analysis, recent progress of failure analysis techniques and several case study results in our companies are described
Keywords :
ULSI; failure analysis; integrated circuit reliability; ULSI; failure analysis; Atomic force microscopy; Electron beams; Failure analysis; Magnetic force microscopy; Optical beams; Optical imaging; Optical microscopy; Scanning electron microscopy; Transmission electron microscopy; Ultra large scale integration;
Conference_Titel :
Microelectronics, 1997. Proceedings., 1997 21st International Conference on
Conference_Location :
Nis
Print_ISBN :
0-7803-3664-X
DOI :
10.1109/ICMEL.1997.632912
