Title : 
ISPSD ´07 Charitat Award; Split-Gate Resurf Stepped Oxide (RSO) MOSFETS for 25V Applications with Record Low Gate-to-Drain Charge
         
        
            Author : 
Goarin, P. ; Koops, G.E.J. ; van Dalen, R. ; LeCam, C. ; Saby, J.
         
        
            Author_Institution : 
NXP Semiconductors Kapeldreef 75 B-3001 Leuven Belgium
         
        
        
            Abstract : 
This paper presents a split-gate version of the Resurf Stepped Oxide (RSO) MOSFET. Splitting the gate enables a drastic reduction of the gate-to-drain capacitance intrinsic to the RSO device concept while keeping all the benefits of the RESURF effect. We achieved a record on-resistance of 3.8 m??mm2 and gate-to-drain charge of 0.9 nCmm2 at a breakdown voltage of 35V for a pitch of 1.3 mm (0.8 mm trench width). The switching losses of our split-gate RSO MOSFET are 4 times better than the best published data in the same voltage range.
         
        
        
        
        
            Conference_Titel : 
Power Semiconductor Devices and IC's, 2008. ISPSD '08. 20th International Symposium on
         
        
            Conference_Location : 
Orlando, FL
         
        
            Print_ISBN : 
978-1-4244-1532-8
         
        
        
            DOI : 
10.1109/ISPSD.2008.4538879