DocumentCode
1725888
Title
Cycle time prediction in wafer fabrication line by applying data mining methods
Author
Tirkel, Israel
Author_Institution
Ind. Eng. & Manage. Dept., Ben-Gurion Univ. of the Negev, Beer-Sheva, Israel
fYear
2011
Firstpage
1
Lastpage
5
Abstract
Wafer fabrication is considered the most complex and costly challenge in the semiconductors industry. Cycle Time (CT), which denotes flow time, is one of its key performance measures. This work develops CT prediction models by applying Machine Learning (ML) and Data Mining (DM) methods. The models can assist in improving manufacturing and supply chain efficiency. They rely on historical production line data taken from the fab´s Manufacturing Execution System (MES), and include wafer lot processing details of various operations. The prediction is done for an average CT of a single lot, processed through a single operation step. Two types of classification techniques are used. The best fitted Decision Trees (DT) model achieves 76.5% accuracy, and the best Neural Network (NN) model (two hidden layers) achieves 87.6% accuracy. The significance of this study is in establishing dynamic CT prediction models, which can be used to predict CT of a single operation step, a line segment or a complete production line.
Keywords
data mining; decision trees; learning (artificial intelligence); neural nets; production engineering computing; semiconductor device manufacture; semiconductor industry; supply chain management; CT prediction model; cycle time prediction; data mining method; fitted decision trees model; machine learning; manufacturing execution system; neural network model; semiconductors industry; supply chain efficiency; wafer fabrication line; Accuracy; Artificial neural networks; Data mining; Manufacturing; Predictive models; Production; Semiconductor device modeling; Cycle Time prediction; Data Mining; Machine Learning; semiconductor wafer fabrication;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2011 22nd Annual IEEE/SEMI
Conference_Location
Saratoga Springs, NY
ISSN
1078-8743
Print_ISBN
978-1-61284-408-4
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2011.5898218
Filename
5898218
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