• DocumentCode
    1726152
  • Title

    Fluxless bonding for fine-pitch and low-volume solder 3-D interconnections

  • Author

    Sakuma, K. ; Toriyama, K. ; Noma, H. ; Sueoka, K. ; Unami, N. ; Mizuno, J. ; Shoji, S. ; Orii, Y.

  • Author_Institution
    IBM Res. - Tokyo, Yamato, Japan
  • fYear
    2011
  • Firstpage
    7
  • Lastpage
    13
  • Abstract
    Fluxless bonding can be used for fine-pitch low-solder-volume interconnections for three-dimensional large-scale integrated-circuit (3D-LSI) applications. Surface treatments with hydrogen radicals, formic acid, vacuum ultraviolet (VUV), and Ar plasma were evaluated as candidate methods for fluxless bonding. Three-μm-thick Sn solders were evaluated for intermetallic-compound (IMC) bonding of 3D integration as a target material for fluxless bonding. X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), time-of-flight secondary ion mass spectrometry (TOF-SIMS), a scanning electron microscope (SEM), and a focused ion beam scanning ion microscope (FIB-SIM) were used to examine the samples. The experiments shows solder oxides and organic contaminants on the surfaces of the micro-bumps were most effectively eliminated without flux by hydrogen radical treatment among various treatments we evaluated. Bonding strength was also improved by the hydrogen radical treatment, since the shear strength was more than 50 times stronger than that of the untreated samples.
  • Keywords
    Auger electron spectra; X-ray photoelectron spectra; integrated circuit bonding; ion microscopy; large scale integration; scanning electron microscopy; secondary ion mass spectra; shear strength; solders; surface treatment; three-dimensional integrated circuits; time of flight mass spectra; tin; 3D-LSI; AES; Auger electron spectroscopy; FIB-SIM; SEM; Sn; TOF-SIMS; X-ray photoelectron spectroscopy; XPS; argon plasma treatment; bonding strength; fine-pitch low-solder-volume interconnections; fluxless bonding; focused ion beam scanning ion microscopy; formic acid treatment; hydrogen radical treatment; intermetallic-compound bonding; low-volume solder 3D interconnections; microbumps; scanning electron microscopy; shear strength; size 3 mum; surface treatments; three-dimensional large-scale integrated-circuit applications; time-of-flight secondary ion mass spectrometry; vacuum ultraviolet treatment; Bonding; Copper; Plasma temperature; Surface treatment; Three dimensional displays; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-61284-497-8
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2011.5898483
  • Filename
    5898483