• DocumentCode
    1726325
  • Title

    A new approach for improving operating margin of unipolar ReRAM using local minimu m of reset voltage

  • Author

    Sakotsubo, Y. ; Terai, M. ; Kotsuji, S. ; Saito, Y. ; Tada, M. ; Yabe, Y. ; Hada, H.

  • Author_Institution
    Device Platforms Res. Labs., NEC Corp., Sagamihara, Japan
  • fYear
    2010
  • Firstpage
    87
  • Lastpage
    88
  • Abstract
    We propose a new approach for improving the operating margin of Ta2O5/plasma oxidized TiO2 stacked unipolar ReRAM. It was found that the reset voltage (switching from low resistance state to high resistance state) can be minimized by using local minimum against the resistance of the low resistance state. In addition, weakening the plasma oxidation condition reduced the power consumption and the variation of reset voltage. Excellent operating margin and more than 105 switching cycle times was successfully demonstrated using the integrated device.
  • Keywords
    random-access storage; tantalum compounds; Ta2O5; local minimum; plasma oxidation condition; power consumption; reset voltage; unipolar ReRAM; Arrays; Fitting; Guidelines; Oxidation; Plasmas; Resistance; Switches; Unipolar ReRAM; non-volatile memory; switching mechanism; switching model; tunnel barrier;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology (VLSIT), 2010 Symposium on
  • Conference_Location
    Honolulu
  • Print_ISBN
    978-1-4244-5451-8
  • Electronic_ISBN
    978-1-4244-5450-1
  • Type

    conf

  • DOI
    10.1109/VLSIT.2010.5556181
  • Filename
    5556181