DocumentCode :
1726437
Title :
Analysis and prospect of local variability of drain current in scaled MOSFETs by a new decomposition method
Author :
Tsunomura, T. ; Kumar, Ajit ; Mizutani, T. ; Lee, C. ; Nishida, A. ; Takeuchi, K. ; Inaba, S. ; Kamohara, S. ; Terada, K. ; Hiramoto, T. ; Mogami, T.
Author_Institution :
MIRAI-Selete, Tsukuba, Japan
fYear :
2010
Firstpage :
97
Lastpage :
98
Abstract :
Causes of drain current local variability are analyzed by decomposing into current variability components. Besides VTH and Gm components, it is newly found that effects of “current onset” variability caused by channel potential fluctuations largely contribute to the current variability and that Gm component is relatively small in the saturation region. It is shown that both VTH and current onset components decreases with reducing channel dopants, indicating that intrinsic channel is very effective to reduce current variability.
Keywords :
MOSFET; decomposition; current onset variability; current variability components; decomposition method; drain current local variability; scaled MOSFET; Current density; Density measurement; FETs; Logic gates; Resource description framework; Semiconductor process modeling; Current variability; Gm; VTH; current onset;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology (VLSIT), 2010 Symposium on
Conference_Location :
Honolulu
Print_ISBN :
978-1-4244-5451-8
Electronic_ISBN :
978-1-4244-5450-1
Type :
conf
DOI :
10.1109/VLSIT.2010.5556185
Filename :
5556185
Link To Document :
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