Title :
Evaluation of Trench-Gate Bipolar-Mode JFETs Used as High-Side Transistors in Low-Voltage Buck Converters
Author :
Yu Wu ; Bo Tian ; Dongqing Hu ; Sin, Johnny K. O. ; Baowei Kang
Author_Institution :
Dept. of Electron. Sci & Tech, Beijing Univ. of Technol., Beijing
Abstract :
For the first time, power loss comparison between 20V-rated devices including a trench MOSFET and four kinds of trench-gate bipolar-mode JFETs (TB-JFETs) was carried out with the help of simulation based on static analysis and mixed-mode dynamic analysis using an inductive switching circuit. With at least 14% power loss improvement at 1 MHz and 19% at 2 MHz compared to that of the trench MOSFET, the calculation results have generated the confidence to take normally-on TB-JFETs, especially the one with buried oxide (BOX) to reduce the gate-drain capacitance CGD which can provide 6% more improvement at both 1 and 2 MHz, as competitive candidates to replace trench MOSFETs as a high-side switch in low-voltage high-frequency buck converters. Experimental data of CGD for normally-on JFETs with and without BOX agree to the simulated results and account for the extra improvement in dynamic loss provided by the device with BOX. On the other hand, the normally-off devices (with and without BOX) always perform the worst within the commonly used frequency range, which implies their uselessness.
Keywords :
MOSFET; bipolar transistors; inductors; junction gate field effect transistors; power convertors; switching circuits; buried oxide; gate-drain capacitance; high-side switch; high-side transistors; inductive switching circuit; low-voltage buck converters; low-voltage high-frequency buck converters; mixed-mode dynamic analysis; power loss; static analysis; trench MOSFET; trench-gate bipolar-mode JFET; Analytical models; Buck converters; Capacitance; Circuit simulation; JFETs; MOSFET circuits; Power MOSFET; Power generation; Switches; Switching circuits;
Conference_Titel :
Power Semiconductor Devices and IC's, 2008. ISPSD '08. 20th International Symposium on
Conference_Location :
Orlando, FL
Print_ISBN :
978-1-4244-1532-8
Electronic_ISBN :
978-1-4244-1533-5
DOI :
10.1109/ISPSD.2008.4538914