Title :
A novel fabrication process for ultra-sharp, high-aspect ratio nano tips using (111) single crystalline silicon
Author :
Jaehong Park ; Kidong Park ; Byoungdoo Choi ; Kyo-in Koo ; Seung-Joon Paik ; Sangjun Park ; Jongpal Kim ; Dong-Il Dan Cho
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea
Abstract :
This paper presents a novel fabrication process for ultra-sharp nano tips on cantilevers with the radius of curvature of less than 10 nm using an (111) single crystalline silicon wafer. The nano tip height 15 /spl mu/m, and the aspect ratio is greater than 3:1. The cone angle of the tip is 19.5/spl deg/. Fabrication process is based on newly obtained etch characteristic data on silicon (111) and the sacrificial bulk micromachining (SBM) technology. The developed fabrication process is simple and robust, and well suited for ultra-sharp, high-aspect ratio nano tips on cantilevers.
Keywords :
elemental semiconductors; etching; micromachining; nanolithography; nanostructured materials; silicon; 15 micron; Si; cantilevers; crystalline silicon wafer; etching; high-aspect ratio nanotips; sacrificial bulk micromachining; ultrasharp nanotips; Crystallization; Fabrication; Lithography; Micromachining; Passivation; Residual stresses; Scanning probe microscopy; Semiconductor films; Silicon; Wet etching;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1216972
