DocumentCode
1728383
Title
Thin film resistor technology and noise reliability indicators
Author
Hruska, Pavel
Author_Institution
Phys. Dept., Tech. Univ. Brno, Czech Republic
Volume
2
fYear
1997
Firstpage
663
Abstract
Low-frequency noise reliability indicator CQ=Su f/U2 for thin film resistors is introduced and its applicability is demonstrated with the use of experimental data. Dispersions of the noise reliability indicator and frequency exponent of large ensembles of resistors manufactured by Japanese, US and European producers are compared with the aim to assess the production technology level. Correlation of results is presented
Keywords
electron device noise; noise; reliability; thin film resistors; LF noise; low-frequency noise; noise reliability indicators; thin film resistor technology; Charge carriers; Fluctuations; Frequency; Low-frequency noise; Manufacturing; Noise shaping; Resistors; Space technology; Transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 1997. Proceedings., 1997 21st International Conference on
Conference_Location
Nis
Print_ISBN
0-7803-3664-X
Type
conf
DOI
10.1109/ICMEL.1997.632932
Filename
632932
Link To Document