MEMS-based X-ray optics for future astronomical missions

Author

Ezoe, Y. ; Mitsuishi, I. ; Ishizu, K. ; Moriyama, T. ; Mitsuda, K. ; Yamasaki, N.Y. ; Ohashi, T. ; Horade, M. ; Sugiyama, S. ; Riveros, R.E. ; Boggs, T. ; Yamaguchi, H. ; Kanamori, Y. ; Gabriel, N.T. ; Talghader, J.J. ; Morishita, K. ; Nakajima, K. ; Maed

Author_Institution

Tokyo Metropolitan Univ., Tokyo, Japan

fYear

2010

Firstpage

191

Lastpage

192

Abstract

X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high-performance optical systems. Curvilinear micropores vertical to a thin wafer are made by using DRIE (Deep Reactive Ion Etching) or X-ray LIGA. The side walls are smoothed by using magnetic field assisted finishing and annealing technologies in order that the walls can reflect X-rays. Two or four such wafers are bent to spherical shapes with different curvature of radii and stacked, to focus parallel X-rays from astronomical objects by multiple reflections. In this paper, the concept and recent advances of the MEMS X-ray optics are reviewed.

Keywords

X-ray apparatus; X-ray optics; astronomical telescopes; finishing; magnetic annealing; micro-optomechanical devices; optical fabrication; sputter etching; MEMS-based X-ray optics; X-ray LIGA; curvilinear micropores; deep reactive ion etching; magnetic field annealing; magnetic field assisted finishing; Micromechanical devices; Mirrors; Optical device fabrication; Optical diffraction; Optical imaging; X-ray imaging;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on

Conference_Location

Sapporo

Print_ISBN

978-1-4244-8926-8

Type

conf

DOI

10.1109/OMEMS.2010.5672121

Filename

5672121