X-ray imaging test for a single-stage MEMS X-ray optical system

Author

Mitsuishi, I. ; Ezoe, Y. ; Ishizu, K. ; Moriyama, T. ; Maeda, Y. ; Hayashi, T. ; Sato, T. ; Mita, M. ; Yamasaki, N.Y. ; Mitsuda, K. ; Horade, M. ; Sugiyama, S. ; Riveros, R.E. ; Boggs, T. ; Yamaguchi, H. ; Kanamori, Y. ; Morishita, K. ; Nakajima, K. ; Mae

Author_Institution

Inst. of Space & Astronaut. Sci. (ISAS), Japan Aerosp. Exploration Agency (JAXA), Sagamihara, Japan

fYear

2010

Firstpage

151

Lastpage

152

Abstract

An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al K_α 1.49 keV for the first time. The image quality estimated as a half power diameter was ~20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 μm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.

Keywords

X-ray imaging; X-ray optics; focusing; micro-optomechanical devices; optical testing; MEMS; X-ray imaging; X-ray optical system; angular resolution; electron volt energy 1.49 keV; surface roughness; Charge coupled devices; Micromechanical devices; Optical device fabrication; Optical imaging; Surface roughness; X-ray imaging;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on

Conference_Location

Sapporo

Print_ISBN

978-1-4244-8926-8

Type

conf

DOI

10.1109/OMEMS.2010.5672138

Filename

5672138