• DocumentCode
    1729540
  • Title

    High-frequency analog GNR-FET design criteria

  • Author

    Imperiale, Ilaria ; Gnudi, Antonio ; Gnani, Elena ; Reggiani, Susanna ; Baccarani, Giorgio

  • Author_Institution
    DEIS, Univ. of Bologna, Bologna, Italy
  • fYear
    2011
  • Firstpage
    303
  • Lastpage
    306
  • Abstract
    Some key aspects of the behavior of graphene nanoribbon (GNR) FETs for high-frequency analog applications are identified and discussed by means of a simulation study based on a full-quantum ballistic transport model. GNRs of width in the order of 10 nm are considered, where the small band-gap and the consequent leakage currents due to band-to-band-tunneling (BTBT) require a careful design. Simulations performed with a realistic model for source/drain metal contacts indicate that a proper choice of the drain doping profile can partially suppress BTBT currents. A 40-nm gate-length 2-nm SiO2 gate-dielectric GNR-FET can achieve a peak small-signal voltage gain of about 30 and a cut-off frequency well above 1 THz.
  • Keywords
    field effect transistors; graphene; nanostructured materials; band-to-band-tunneling; field effect transistors; full-quantum ballistic transport model; gate-dielectric GNR-FET; graphene nanoribbon; high-frequency analog GNR-FET design criteria; leakage currents; size 10 nm; size 2 nm; size 40 nm; source-drain metal contacts; Doping; Electric potential; FETs; Logic gates; Metals; Photonic band gap; Semiconductor process modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference (ESSDERC), 2011 Proceedings of the European
  • Conference_Location
    Helsinki
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4577-0707-0
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2011.6044174
  • Filename
    6044174