Title :
Application of Genetic algorithm on IC substrate drilling path optimization
Author :
Tsai, C.Y. ; Liu, C.H. ; Wang, Y.C.
Author_Institution :
Dept. of Ind. Eng. & Manage., Yuan-Ze Univ., Taoyuan, Taiwan
Abstract :
This paper proposes genetic algorithm (GA) based heuristic algorithms for the integrated circuit (IC) substrate drilling path optimization problem. IC substrates are cut from a piece of copper clad laminate which contains tens of thousands of holes. A path connecting these holes has to be plotted for the drilling operation. The objective in this research is minimizing the total path length. Thus, this problem is treated as a large scale traveling salesman problem. In this research, we developed three effective algorithms, unit optimization algorithm, two units incremental algorithm, and local fine-tune algorithm. This study employs a numerical experiment to determine the appropriate combination of algorithm parameter values. Test instances obtained from the case company were used to evaluate the performance of the proposed algorithms. It is shown that unit optimization algorithm is able to effectively obtain the approximate optimal value similar to the solutions of case company in fastest time. Furthermore, the two unit incremental algorithm and local fine-tune algorithm successfully improve execution time and solution stability.
Keywords :
circuit optimisation; circuit stability; copper; drilling; genetic algorithms; heuristic programming; integrated circuit modelling; laminates; travelling salesman problems; IC substrate drilling path optimization; copper clad laminate; genetic algorithm; heuristic algorithms; integrated circuit substrate drilling path optimization problem; large scale traveling salesman problem; local fine-tune algorithm; solution stability; unit incremental algorithm; unit optimization algorithm; Companies; Computer aided software engineering; Genetics; Integrated circuits; Lasers; Optimization; Strips;
Conference_Titel :
Advanced Mechatronic Systems (ICAMechS), 2012 International Conference on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4673-1962-1