DocumentCode :
1729816
Title :
Spectral performance of a silicon IR microspectrometer
Author :
Kong, S.-H. ; de Graaf, G. ; Wolffenbuttel, R.F.
Author_Institution :
Dept. for Micro-Electron., Delft Univ. of Technol., Bilthoven, Netherlands
Volume :
2
fYear :
2003
Firstpage :
1610
Abstract :
The performance of an optical IR microspectrometer fabricated in silicon using IC-compatible micromachining is presented. The components are distributed over two silicon wafers. One contains an aluminum-based grating and the other an array of poly-silicon thermocouples with readout circuits. The optical path is defined after low-temperature aligned wafer-to-wafer bonding. Design considerations, fabrication and performance are presented. Measurements confirm an IR operating range between 1 and 9 /spl mu/m and a half-power spectral resolution of 0.5 /spl mu/m.
Keywords :
elemental semiconductors; infrared spectrometers; micro-optics; microsensors; silicon; wafer bonding; 1 to 9 micron; IC compatible micromachining; Si; aluminum based grating; polysilicon thermocouple; silicon optical IR microspectrometer; silicon wafer; wafer bonding; Biomedical optical imaging; Extraterrestrial measurements; Gratings; Integrated optics; Optical device fabrication; Optical refraction; Optical sensors; Sensor arrays; Silicon; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
Type :
conf
DOI :
10.1109/SENSOR.2003.1217089
Filename :
1217089
Link To Document :
بازگشت