• DocumentCode
    1729816
  • Title

    Spectral performance of a silicon IR microspectrometer

  • Author

    Kong, S.-H. ; de Graaf, G. ; Wolffenbuttel, R.F.

  • Author_Institution
    Dept. for Micro-Electron., Delft Univ. of Technol., Bilthoven, Netherlands
  • Volume
    2
  • fYear
    2003
  • Firstpage
    1610
  • Abstract
    The performance of an optical IR microspectrometer fabricated in silicon using IC-compatible micromachining is presented. The components are distributed over two silicon wafers. One contains an aluminum-based grating and the other an array of poly-silicon thermocouples with readout circuits. The optical path is defined after low-temperature aligned wafer-to-wafer bonding. Design considerations, fabrication and performance are presented. Measurements confirm an IR operating range between 1 and 9 /spl mu/m and a half-power spectral resolution of 0.5 /spl mu/m.
  • Keywords
    elemental semiconductors; infrared spectrometers; micro-optics; microsensors; silicon; wafer bonding; 1 to 9 micron; IC compatible micromachining; Si; aluminum based grating; polysilicon thermocouple; silicon optical IR microspectrometer; silicon wafer; wafer bonding; Biomedical optical imaging; Extraterrestrial measurements; Gratings; Integrated optics; Optical device fabrication; Optical refraction; Optical sensors; Sensor arrays; Silicon; Spectroscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
  • Conference_Location
    Boston, MA, USA
  • Print_ISBN
    0-7803-7731-1
  • Type

    conf

  • DOI
    10.1109/SENSOR.2003.1217089
  • Filename
    1217089