Title :
Fabrication of an active nanostencil with integrated microshutters
Author :
Tjerkstra, R.W. ; Ekkels, P. ; Krijnen, G. ; Egger, S. ; Berenschot, E. ; Ma, K.C. ; Brugger, J.
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
Abstract :
An active nanostencil, consisting of a thin (200 nm) silicon nitride membrane with attached polysilicon microactuators that can be used to dynamically open and/or close holes in the silicon nitride membrane, is presented. This nanostencil can be used as a shadow mask in an evaporation setup. Main features of the nanostencil are the absence of sacrificial oxide in the final product, strengthening of the membrane by a polysilicon hexagonal structure that is attached directly to the membrane and the use of low-doped regions in the polysilicon to separate the stator and rotor electrically.
Keywords :
elemental semiconductors; evaporation; membranes; microactuators; nanostructured materials; silicon; silicon compounds; 200 nm; Si; SiN; evaporation; integrated microshutters; nanostencil; polysilicon hexagonal structure; polysilicon microactuators; silicon nitride membrane; Actuators; Biomembranes; Conducting materials; Etching; Fabrication; Microactuators; Shape; Silicon; Stators; Surface cleaning;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1217099