DocumentCode :
1730083
Title :
Low voltage electrostatic 90° turning flap for reflective MEMS display
Author :
Jutzi, Fabio ; Gueissaz, François ; Noell, Wilfried ; De Rooij, Nico F.
Author_Institution :
Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland
fYear :
2010
Firstpage :
77
Lastpage :
78
Abstract :
A low voltage electrostatically actuated 90° turning flap is modeled and fabricated. The application is a new kind reflective, low-power, MEMS-based display with high contrast and reflectance. The system consists of a poly-silicon flap fabricated onto a silicon substrate with a transparent counter electrode on glass and a device layer of a silicon-on-insulator (SOI) wafer as spacer in between them. Actuation voltages down to 20V are achieved.
Keywords :
integrated optics; liquid crystal displays; micro-optomechanical devices; optical fabrication; reflectivity; silicon-on-insulator; Si; actuation voltages; low voltage electrostatically actuated turning flap; polysilicon flap; reflectance; reflective MEMS display; silicon substrate; silicon-on-insulator wafer; transparent counter electrode; Arrays; Electrodes; Electrostatics; Pixel; Silicon on insulator technology; Substrates; Turning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-8926-8
Electronic_ISBN :
978-1-4244-8925-1
Type :
conf
DOI :
10.1109/OMEMS.2010.5672177
Filename :
5672177
Link To Document :
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