ALD high-k layer grating couplers for single and double slot on-chip SOI photonics

Author

Naiini, Maziar M. ; Henkel, Christoph ; Malm, Gunnar B. ; Östling, Mikael

Author_Institution

Sch. of Inf. & Commun. Technol., KTH - R. Inst. of Technol., Kista, Sweden

fYear

2011

Firstpage

191

Lastpage

194

Abstract

State of the art grating couplers for horizontal single and double slot waveguides are presented; in these devices the input signal is transmitted from a single mode optical fiber to silicon on insulator slot waveguides. In the waveguides, atomic layer deposited (ALD) high-k dielectrics form the low refractive index slot. It is demonstrated that the new fully etched design combined with precision of ALD result in highly reproducible devices with efficiency variations less than 1%. Devices have a peak coupling efficiency of 24% at 1.55 μm. In order to achieve the optimal design, optical properties of high-k films are studied with spectroscopic ellipsometry. Measured refractive indices show variations from reference values, originated from film densities.

Keywords

atomic layer deposition; ellipsometry; high-k dielectric thin films; optical fibres; silicon-on-insulator; waveguide couplers; ALD high-k layer grating couplers; atomic layer deposited high-k dielectrics; optical properties; refractive index; silicon on insulator slot waveguides; single mode optical fiber; slot on-chip SOI photonics; slot waveguides; spectroscopic ellipsometry; Couplers; Gratings; Optical films; Optical refraction; Optical variables control; Optical waveguides;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference (ESSDERC), 2011 Proceedings of the European

Conference_Location

Helsinki

ISSN

1930-8876

Print_ISBN

978-1-4577-0707-0

Electronic_ISBN

1930-8876

Type

conf

DOI

10.1109/ESSDERC.2011.6044202

Filename

6044202