• DocumentCode
    1730433
  • Title

    Thermo-mechanical behavior of through silicon vias in a 3D integrated package with inter-chip microbumps

  • Author

    Liu, Xi ; Chen, Qiao ; Sundaram, Venkatesh ; Simmons-Matthews, Margaret ; Wachtler, Kurt P. ; Tummala, Rao R. ; Sitaraman, Suresh K.

  • Author_Institution
    George W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2011
  • Firstpage
    1190
  • Lastpage
    1195
  • Abstract
    Through-silicon via (TSV), being one of the key enabling technologies for 3D system integration, is being used to interconnect 3D vertically stacked devices, such as logic, memory, sensors, and actuators that are fabricated on separate wafers and then interconnected by either wafer-to-wafer or chip-to-wafer methods. However, thermo-mechanical analyses on TSVs are limited, and most of the existing studies focus on the thermo-mechanical analysis of TSVs in a freestanding wafer, rather than in an integrated package. In this paper, three-dimensional thermo-mechanical finite-element models have been built to analyze the stress/strain distribution in a 3D integrated package which contains stacked dice with TSVs, inter-chip microbumps, overmold, and underfilled solder bumps, and an organic substrate. Models show that the stresses in the TSV under packaging configuration could be generally lower than the stresses in the TSV in a free-standing wafer. Also, the models show that the high-strain region switches from TSV corners to microbumps.
  • Keywords
    electronics packaging; integrated circuit interconnections; 3D integrated package; 3D system integration; chip-to-wafer method; finite-element model; inter-chip microbumps; organic substrate; stress/strain distribution; thermo-mechanical analysis; thermo-mechanical behavior; through silicon vias; wafer-to-wafer method; Copper; Packaging; Strain; Stress; Thermomechanical processes; Three dimensional displays; Through-silicon vias; 3D Packaging; Finite-Element Modeling; Thermo-Mechanical Stress Analysis; Through Silicon Via;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-61284-497-8
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2011.5898661
  • Filename
    5898661