Title :
Polarity effect on the behavior of gas puff z-pinch plasma produced by IPP system
Author :
Imasaka, K. ; Takahashi, Koichi ; Suehiro, Junya ; Hara, Masaki
Author_Institution :
Kyushu Univ., Fukuoka, Japan
Abstract :
Summary form only given, as follows. Hot spots produced by gas-puff z-pinch plasma which are high energy density plasma regions radiate intensive soft X-rays. A gas-puff z-pinch is expected in industrial applications such as soft X-ray lithography, microscopy and lasers. In these cases, the scattering of hot spots is important when the gas-puff z-pinch plasma is used as a point source of soft X-rays. Previous results in our study showed the reduction of radial displacement of hot spots in positive voltage shots by using a IPP (inductive pulsed power) system. In the paper, the voltage polarities effect on the z-pinch plasma behavior, soft X-ray emission and spatial distribution of hot spots are described.
Keywords :
X-ray production; Z pinch; plasma density; plasma diagnostics; plasma production; IPP system; gas-puff z-pinch; gas-puff z-pinch plasma; high energy density plasma regions; hot spots; hot spots spatial distribution; inductive pulsed power system; industrial applications; point source; polarity effect; positive voltage shots; puff z-pinch plasma; radial displacement; soft X-ray emission; soft X-ray laser; soft X-ray lithography; soft X-ray microscopy; soft X-rays; spatial distribution; voltage polarities effect; z-pinch plasma; z-pinch plasma behavior; Gas industry; Gas lasers; Microscopy; Plasma applications; Plasma density; Plasma sources; Plasma x-ray sources; Voltage; X-ray lasers; X-ray lithography;
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
DOI :
10.1109/PPPS.2001.960777
