DocumentCode
1730612
Title
Nanostructured origami™ folding of patternable resist for 3D lithography
Author
Yang, Se Young ; Choi, Hyung-ryul Johnny ; Deterre, Martin ; Barbastathis, George
Author_Institution
Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear
2010
Firstpage
37
Lastpage
38
Abstract
A new method to fold free standing poly(methyl methacrylate) (PMMA) resist using e-beam exposure is developed and demonstrated. The results prove controllable folding of the patterned PMMA. An explanation of the folding mechanism is proposed based on experimental characterization and theoretical analysis. 3D lithography is achieved by attaching the patterned resist on an adjacent side wall by folding. Patterns are effectively transferred by depositing metal followed by a lift-off process.
Keywords
electron beam effects; nanofabrication; nanolithography; nanopatterning; nanostructured materials; polymers; resists; 3D lithography; electron beam effects; fold free standing poly(methyl methacrylate); lift-off process; nanopatterning; nanostructured origami folding; patternable resist; Acceleration; Biomembranes; Lithography; Resists; Silicon; Surface charging; Three dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics (OPT MEMS), 2010 International Conference on
Conference_Location
Sapporo
Print_ISBN
978-1-4244-8926-8
Electronic_ISBN
978-1-4244-8925-1
Type
conf
DOI
10.1109/OMEMS.2010.5672197
Filename
5672197
Link To Document