DocumentCode :
1731586
Title :
Floating gate memories: Moore´s law continues
Author :
Lai, Stefan K.
Author_Institution :
Intel Corp., Santa Clara, CA, USA
fYear :
2005
Firstpage :
74
Lastpage :
77
Abstract :
Floating gate memories are the mainstream of flash non volatile memories and have followed Moore´s law scaling through multiple technology generations, representing one of the fastest growing memory segments. Looking forward, maintaining the pace of Moore´s law scaling is increasingly difficult. The challenging areas include electrical, physical and reliability characteristics of the memory cell. However, through innovative device design, introduction of new materials and memory error management, we anticipate that floating gate flash memories are economically viable beyond 45 nm to 32 nm. In this paper, the physical and electrical scaling challenges as well as possible solutions are discussed. Further, more complex, structural innovations may be possible to maintain further scaling.
Keywords :
flash memories; random-access storage; Moore law; electrical characteristic; flash nonvolatile memory; floating gate flash memory; floating gate memory; memory cell; memory error management; physical characteristic; reliability characteristic; Capacitance; Dielectrics; Educational institutions; Lithography; Maintenance; Memory management; Moore´s Law; Nonvolatile memory; Thickness control; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 2005. (VLSI-TSA-Tech). 2005 IEEE VLSI-TSA International Symposium on
ISSN :
1930-8868
Print_ISBN :
0-7803-9058-X
Type :
conf
DOI :
10.1109/VTSA.2005.1497087
Filename :
1497087
Link To Document :
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