Title :
A New Technique For Quantitative Determination Of The Stress Profile Along The Depth Of P+ Silicon Films
Author :
Yang, E.H. ; Yang, S.S.
Author_Institution :
AJOU University
Keywords :
Atomic layer deposition; Atomic measurements; Boron; Etching; Oxidation; Residual stresses; Semiconductor films; Silicon; Tensile stress; Thermal stresses;
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
DOI :
10.1109/SENSOR.1995.721746
