Stress Profile Characterization And Test Structures Analysis Of Single And Double Ion Implanted LPCVD Polycrystalline Silicon

Author

Benítez, M.A. ; Esteve, J. ; Benrakkad, S. ; Morante, J.R. ; Samitier, J. ; Schweitz, J.A.

Author_Institution

Centre Nacional de Microclectronica CSIC

Volume

fYear

1995

Firstpage

Lastpage

Keywords

Annealing; Compressive stress; Doping; Fabrication; Micromachining; Residual stresses; Silicon; Temperature; Tensile stress; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on

Print_ISBN

91-630-3473-5

Type

DOI

10.1109/SENSOR.1995.721751

Filename

721751

Link To Document