DocumentCode
1732896
Title
Development of a non-conductive, no-flow wafer level underfill
Author
Su, Chan-Lu ; Yeh, Kuo Yu ; Lin, Chang Chih
Author_Institution
Powertech Technol. Inc., Hsinchu, Taiwan
fYear
2011
Firstpage
1800
Lastpage
1804
Abstract
WLCSP (wafer level chip scale package) has been developed for several years to reduce package size, process cost and to increase product reliability. With the development of high-density, flip chip packages, an underfill process for fine-pitch bump size become more important. WLUF (wafer level underfill) is a technology that applies an underfill material onto a wafer front side and encapsulates the flip chip package without the need for capillarity flow and flux dispensing. Thus, voids from capillarity flow may be avoided and flux-dispensing process is eliminated to prevent potential reliability risks resulting from residual fluxes. In this study, we describe the investigation of a new WLUF technology for fine pitch WLCSP packages and present the lamination and bonding test results using the WLUF materials on our test WLCSP packages.
Keywords
flip-chip devices; semiconductor device reliability; wafer level packaging; capillarity flow; fine-pitch bump size; flip chip package; flux-dispensing process; no-flow wafer level underfill; nonconductivev wafer level underfill; product reliability; reliability risk; underfill material; wafer front side; wafer level chip scale package; Bonding; Films; Flip chip; Lamination; Substrates; Vehicles;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
Conference_Location
Lake Buena Vista, FL
ISSN
0569-5503
Print_ISBN
978-1-61284-497-8
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2011.5898758
Filename
5898758
Link To Document