• DocumentCode
    1733766
  • Title

    Electrical, optical and fluidic through-silicon vias for silicon interposer applications

  • Author

    Parekh, Mahavir S. ; Thadesar, Paragkumar A. ; Bakir, Muhannad S.

  • Author_Institution
    Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2011
  • Firstpage
    1992
  • Lastpage
    1998
  • Abstract
    Modern high-performance computing systems and data centers are implemented as many-core server systems. Current state of the art data centers have server racks with pluggable boards where each board has many multi-core processors and memory units. These boards are connected via electrical or optical cables. In such systems, communication bandwidth between the high-speed microprocessor cores and the memory is limited. To leverage full performance of these powerful chips, it is required to provide high memory bandwidth as well as effective power delivery and heat removal solutions. To address these challenges in high performance computing systems, we present a 3D packaging solution that includes a novel silicon interposer with electrical, optical, and fluidic (trimodal) interconnects and through-silicon vias (TSVs). The electrical TSVs in the silicon interposer enable power and signal delivery from motherboard to chips stacked on top of the interposer. The optical TSVs in the silicon interposer can provide ultra-high bandwidth communication between chips on different silicon interposers through motherboard level optical links. The fluidic TSVs enable a coolant to be routed from the motherboard to the chips on the silicon interposer. We have fabricated and characterized polymer-clad electrical TSVs (for low stress) with diameter that meets ITRS projections for high-performance computing systems. Using the same polymer used for the cladding of electrical TSVs, we have fabricated and characterized optical TSVs adjacent to electrical TSVs. Spin coating of the photodefinable polymer for electrical and optical TSVs is done in single step. Fabrication of fluidic TSVs can be done using the same cladding as that of the polymer-clad electrical TSVs without electroplating the copper. This leaves behind an empty polymer-clad via which can be used as a fluidic TSV.
  • Keywords
    integrated circuit interconnections; three-dimensional integrated circuits; 3D packaging solution; art data centers; cladding; communication bandwidth; copper; electrical cable; electrical interconnect; electrical through-silicon vias; electroplating; fluidic TSV; fluidic interconnect; fluidic through-silicon vias; high performance computing system; high speed microprocessor core; high-performance computing system; many multicore processor; many-core server system; memory bandwidth; memory unit; motherboard level optical links; optical TSV; optical cable; optical interconnect; optical through-silicon vias; photodefinable polymer; pluggable boards; polymer-clad electrical TSV; server racks; silicon interposer application; Optical device fabrication; Optical fibers; Optical polymers; Optical variables measurement; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2011 IEEE 61st
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-61284-497-8
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2011.5898790
  • Filename
    5898790