Abstract :
The following topics are dealt: semiconductor junction technology; doping technology; nano-CMOS technology; ion implant technology; junction for CMOS devices; annealing technology; silicide and Schottky S/D MOSFET.
Keywords :
CMOS integrated circuits; MOSFET; Schottky gate field effect transistors; annealing; ion implantation; nanoelectronics; semiconductor doping; semiconductor junctions; semiconductor technology; CMOS device junction; Schottky S/D MOSFET; annealing technology; doping technology; ion implant technology; nanoCMOS technology; semiconductor junction technology; silicide S/D MOSFET;
Conference_Titel :
Junction Technology, 2008. IWJT '08. Extended Abstracts - 2008 8th International workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1737-7
DOI :
10.1109/IWJT.2008.4539999
