Controlled dose-modulated ion implantation on serial implanters

In order to compensate the variation from other processes, an intentional non-uniform dosage mapping system has been developed. Modulating both vertical and horizontal scan speed makes it possible to implant in two-dimensional non-uniform dosage even for high-tilt implantation. For zero-degree angle implantation, more complicated non-uniform dosage mapping can be achieved by combining the scan control with step-wise rotations.