DocumentCode :
1735263
Title :
A matched expansion probe card for high temperature LSI testing
Author :
Choe, Seong-Hun ; Fujimoto, Satoshi ; Tanaka, Shuji ; Esashi, Masayoshi
Author_Institution :
Dept. of Nanomechanics, Tohoku Univ., Sendai, Japan
Volume :
2
fYear :
2005
Firstpage :
1259
Abstract :
This paper describes the fabrication process and mechanical properties of a novel probe card were described. To match the thermal expansion between the probe card and a silicon wafer in wafer-level burn-in test, a Pyrex glass substrate with feedthrough connections was used to support the probes. To make the slantwise probe contactors, spray coating was used to form a uniform photoresist film on a deeply-wet-etched silicon wafer. The fabricated probe card has 13185 p+ silicon probe contactors at a pitch of 150 μm on an area of 44.0 mm × 45.7 mm. The rigidity of the probes is approximately 91.45 N/m. The planarity of the probe tips is within ± 1 μm from the base level.
Keywords :
integrated circuit testing; large scale integration; point contacts; probes; silicon; thermal expansion; LSI testing; Pyrex glass substrate; Si; fabrication process; matched expansion probe card; photoresist film; silicon wafer; slantwise probe contactors; spray coating; thermal expansion; wafer-level burn-in test; wet etching; Contactors; Fabrication; Glass; Large scale integration; Mechanical factors; Probes; Silicon; Temperature; Testing; Thermal expansion;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN :
0-7803-8994-8
Type :
conf
DOI :
10.1109/SENSOR.2005.1497308
Filename :
1497308
Link To Document :
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