DocumentCode :
1735373
Title :
Predicting thermal behavior of interconnects
Author :
Gill, J. ; Harmon, D. ; Furukawa ; Sullivan
Author_Institution :
Microelectron. Div., IBM Corp., Essex Junction, VT, USA
fYear :
1999
fDate :
6/21/1905 12:00:00 AM
Firstpage :
54
Lastpage :
60
Abstract :
Previous investigations into thermal characteristics of embedded interconnects produced a wafer level technique for measurement of the thermal conductance, as well as a quasi-analytical model for predicting the results (Harmon, Gill and Sullivan, IRW 1998). In this paper, measurements of the thermal characteristics of embedded interconnects with underlying insulator thicknesses from 1.0 to 0.1 μm are presented. These measurements indicate the thermal conductance for thin insulators is significantly less than that predicted by the quasi-analytical model. Through finite element modeling, this discrepancy is shown to be due to localized substrate heating. An “effective conductivity” method is presented to extend the quasi-analytical model to include substrate-heating effects. This same approach is proposed for analysis of composite insulator structures including low K dielectrics. The methodology is assessed by comparing modeled and measured fuse current densities for embedded interconnects of varying width and underlying insulator thickness
Keywords :
current density; finite element analysis; integrated circuit interconnections; integrated circuit modelling; integrated circuit reliability; thermal conductivity; composite insulator structures; embedded interconnects; finite element modeling; fuse current densities; localized substrate heating; low K dielectrics; substrate-heating; thermal conductance; underlying insulator thickness; wafer level technique; Current measurement; Density measurement; Dielectric substrates; Dielectrics and electrical insulation; Finite element methods; Heating; Predictive models; Semiconductor device modeling; Thermal conductivity; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 1999. IEEE International
Conference_Location :
Lake Tahoe, CA
Print_ISBN :
0-7803-5649-7
Type :
conf
DOI :
10.1109/IRWS.1999.830558
Filename :
830558
Link To Document :
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