• DocumentCode
    1735485
  • Title

    Optimal design of inductively coupled plasma torch using parametric study and design sensitivity analysis

  • Author

    Seo, Jae Hyun ; Kim, Kwang Soon ; Hong, Seung Ho

  • Author_Institution
    Seoul Nat. Univ., South Korea
  • fYear
    2001
  • Firstpage
    293
  • Abstract
    Summary form only given, as follows. A parametric study and a design sensitivity analysis have been carried out to find the optimal design conditions and thermal plasma configurations of an Inductively Coupled Plasma (ICP) torch. Firstly, the parametric study is conducted with the following criteria on thermal plasma properties; i) sufficiently high temperature ( > 8000 K), ii) a large volume of hot temperature, and iii) no recirculating flow near the torch inlet. Next, the sensitivity of plasma temperature distributions is derived from the results of parametric study by estimating the optimal ranges of parameters and giving the initial guessing values for the sensitivity analysis. The derived sensitivity of plasma temperature distributions is analyzed using the gradient method for the thermal plasma configurations to produce the broader hot region and more uniform temperature distributions. Finally, these two results are compared, and the optimum design values for ICP torches of 15 kW usable for material processing are presented.
  • Keywords
    plasma diagnostics; plasma materials processing; plasma temperature; plasma torches; sensitivity analysis; temperature distribution; 15 kW; 8000 K; ICP torches; design sensitivity analysis; gradient method; hot region; hot temperature; inductively coupled plasma torch; initial guessing values; material processing; optimal design; optimal design conditions; optimal parameter ranges; optimum design values; parametric study; plasma temperature distributions; sensitivity; sensitivity analysis; thermal plasma configurations; thermal plasma properties; torch inlet; uniform temperature distributions; Gradient methods; Materials processing; Parametric study; Plasma materials processing; Plasma properties; Plasma temperature; Sensitivity analysis; Temperature distribution; Temperature sensors; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
  • Conference_Location
    Las Vegas, NV, USA
  • Print_ISBN
    0-7803-7141-0
  • Type

    conf

  • DOI
    10.1109/PPPS.2001.960951
  • Filename
    960951