Title :
Analysis and improvement on the uniformity of sheet resistance of nickel silicide
Author :
Tomita, Ryuji ; Yasuda, Makoto ; Kimura, Hiroshi ; Maeda, Kazutaka ; Ueno, Shuichiro ; Moritoki, Masashige
Author_Institution :
Process Technol. Div., NEC Electron. Corp., Sagamihara
Abstract :
Furnace anneal for the first anneal dramatically improves the uniformity of the sheet resistance of nickel silicide at small area. The main cause of the deterioration in the uniformity of the sheet resistance is not the crystalline state or the implanted impurities but the size of the pattern which nickel silicide is formed at.
Keywords :
annealing; electric resistance; nickel compounds; NiSi; Si; crystalline state; furnace anneal; nickel silicide; sheet resistance; Annealing; Conductivity; Crystallization; Electrical resistance measurement; Impurities; National electric code; Nickel; Silicides; Silicon; Temperature;
Conference_Titel :
Junction Technology, 2008. IWJT '08. Extended Abstracts - 2008 8th International workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1737-7
Electronic_ISBN :
978-1-4244-1738-4
DOI :
10.1109/IWJT.2008.4540040
