Title : 
Analysis of photoconductive sampling method for micro PCSS
         
        
            Author : 
Qinggang, Liu ; Xia, Gao ; Xurui, Mao ; Xiaona, Lou ; Heng, Zhao ; Ling, Zhao ; Xiaotang, Hu
         
        
            Author_Institution : 
State key Lab. of Precision Meas. Technol. & Instrum., Tianjin Univ., Tianjin
         
        
        
        
        
            Abstract : 
Via atomic force microscope (AFM)´s tip induced anodic oxidization and photolithograph method, a lOOnm wide metal-insulator-metal (MIM) junction instead of an air gap was fabricated on the GaAs substrate to make a micro type photoconductive semiconductor switch (PCSS). A PCSS signal test system based on photoconductive sampling (PC) method was adopted. The PCSS´s equivalent circuit mode was analyzed. The pulse width of the femtosecond laser is about 50 fs, the central wavelength is 800 nm, and the pulse energy is about lmJ with a repetition rate of 100 MHz. With this equivalent mode and experiment parameters, the pulse generator´s output was simulated via MATLAB. The performance of the sampling gate is analyzed, and its output charge Qs expression is explained.
         
        
            Keywords : 
MIM devices; anodisation; atomic force microscopy; high-speed optical techniques; microswitches; photoconducting switches; photolithography; sampling methods; AFM; GaAs; GaAs substrate; anodic oxidization; atomic force microscope; equivalent circuit mode; femtosecond laser; metal-insulator-metal junction; micro photoconductive semiconductor switch; photoconductive sampling method; photolithograph method; sampling gate; Atomic force microscopy; Gallium arsenide; Metal-insulator structures; Optical pulses; Photoconducting materials; Photoconductivity; Sampling methods; Space vector pulse width modulation; Substrates; Switches;
         
        
        
        
            Conference_Titel : 
Junction Technology, 2008. IWJT '08. Extended Abstracts - 2008 8th International workshop on
         
        
            Conference_Location : 
Shanghai
         
        
            Print_ISBN : 
978-1-4244-1737-7
         
        
            Electronic_ISBN : 
978-1-4244-1738-4
         
        
        
            DOI : 
10.1109/IWJT.2008.4540043