DocumentCode :
1737844
Title :
Silicon technology: from submicron dimensions to large areas
Author :
Beenakker, C.I.M.
Author_Institution :
Delft Inst. of Microelectron. & Submicrontechnol., Netherlands
fYear :
1999
fDate :
22-24 Nov. 1999
Firstpage :
3
Abstract :
Summary form only given. The need for cheaper and faster logic and memory integrated circuits is a strong push in the development of silicon technology to enable smaller minimal dimensions on the chip. On the other hand, the silicon technology as used in micro-systems, high frequency semiconductors and large area devices such as TFT displays and solar cells is rather driven by factors such as the need for IC process compatibility, low temperature processing and less common materials. In this presentation, the technological challenges in the various areas are indicated and common trends identified. It is then shown that a combination of the different technologies leads to unique system solutions.
Keywords :
elemental semiconductors; integrated circuit technology; large screen displays; liquid crystal displays; micromechanical devices; semiconductor technology; silicon; solar cells; thin film transistors; IC process compatibility; Si; TFT displays; chip dimensions; high frequency semiconductors; large area devices; logic integrated circuits; low temperature processing; memory integrated circuits; micro-systems; silicon technology; solar cells; Displays; Frequency; Integrated circuit technology; Logic circuits; Logic devices; Photovoltaic cells; Semiconductor materials; Silicon; Temperature; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics, 1999. ICM '99. The Eleventh International Conference on
Print_ISBN :
0-7803-6643-3
Type :
conf
DOI :
10.1109/ICM.2000.884792
Filename :
884792
Link To Document :
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