DocumentCode
1739176
Title
ULSI technology development trend
Author
Okuto, Yuji ; Kunio, Takemitsu
Author_Institution
Natural Sci. Center, Nagoya City Univ., Japan
Volume
1
fYear
2000
fDate
2000
Firstpage
3
Abstract
Owing to the progress of various technology, integration scale and performance of ULSI is making continuous progress. However, depending on progress stage, main area of development has been varied. Lately, fine-scale CMOS, interconnect technology and nonvolatile memory are the main area of interest. In this paper, present technology development trend on these areas will be discussed
Keywords
ULSI; integrated circuit technology; technological forecasting; ULSI technology; development trends; fine-scale CMOS; interconnect technology; nonvolatile memory; Annealing; Binary search trees; CMOS technology; FETs; Insulation; Laser beams; Lattices; Silicon; Ultra large scale integration; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2000. CAS 2000 Proceedings. International
Conference_Location
Sinaia
Print_ISBN
0-7803-5885-6
Type
conf
DOI
10.1109/SMICND.2000.890183
Filename
890183
Link To Document