Title :
New versatile and easy selective boron diffusion
Author :
Liiceanu, Carmen ; Niculae, M. ; Rauta, M.
Author_Institution :
S.C. Baneasa S.A., Bucharest, Romania
Abstract :
The paper presents a new method for selective boron diffusion using metallic source and normal open quartz tube, for a wide range of surface concentration. The advantages of the method are: good process reproducibility, very thin, easy removable glass layer, effortless operation and best financial results
Keywords :
boron; diffusion; elemental semiconductors; impurity distribution; semiconductor doping; silicon; Si:B; metallic source; normal open quartz tube; process reproducibility; removable glass layer; selective diffusion; surface concentration; Atmosphere; Boats; Boron; Fluid flow; Glass; Nitrogen; Silicon; Solids; Surface treatment; Temperature;
Conference_Titel :
Semiconductor Conference, 2000. CAS 2000 Proceedings. International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-5885-6
DOI :
10.1109/SMICND.2000.890208
