Title :
Low threshold current operation of 1.3 μm BH laser diodes with self-defined AlInAs-oxide current-confinement layer
Author :
Ko, Hyun-Chul ; Nakamura, Takahiro ; Koui, Tomoaki ; Suzuki, Naofumi ; Terakado, Tomoji ; Kobayashi, Kaoru
Author_Institution :
Syst. Devices & Fudamental Res., NEC Corp., Shiga, Japan
Abstract :
A self-defined oxide-aperture structure combined with a buried heterostructure (BH) fabricated by simple process is strongly required from the viewpoint of low threshold current, mode control, run-to-run reproducibility, and in-plane uniformity of laser characteristics. A novel structure of 1.3 μm BH laser diodes with a self-defined AlInAs-oxide current-blocking layer is proposed and successfully demonstrated. The oxidation of AlInAs was automatically stopped near the active layer buried in InP. This resulted in the lowest threshold current operation ever reported in oxide-confined long wavelength laser diodes, to our best knowledge
Keywords :
III-V semiconductors; aluminium compounds; buried layers; current density; etching; gallium arsenide; indium compounds; oxidation; quantum well lasers; 1.3 micron; AlInAs; BH laser diodes; InGaAsP; MQW active layer; buried active layer; in-plane uniformity; low threshold current operation; mode control; oxidation; oxide current-confinement layer; oxide-confined long wavelength LD; run-to-run reproducibility; selective etching; self-defined oxide-aperture structure; Diode lasers; Etching; Insulation; Laser modes; Optical buffering; Optical surface waves; Surface emitting lasers; Temperature distribution; Threshold current; Vertical cavity surface emitting lasers;
Conference_Titel :
Lasers and Electro-Optics Society 2000 Annual Meeting. LEOS 2000. 13th Annual Meeting. IEEE
Conference_Location :
Rio Grande
Print_ISBN :
0-7803-5947-X
DOI :
10.1109/LEOS.2000.890708