DocumentCode :
1741389
Title :
Effect of superposition assumption on Monte Carlo dose calculation about shielded gynecological colpostats
Author :
Markman, J. ; Williamson, J.F. ; Low, D.A. ; Dempsey, J.F.
Author_Institution :
Mallinckrodt Inst. of Radiol., Washington Univ. Sch. of Med., St. Louis, MO, USA
Volume :
1
fYear :
2000
fDate :
2000
Firstpage :
387
Abstract :
The Fletcher-Suit-Delclos (FSD) intracavitary vaginal applicator typically incorporates tungsten shielding to reduce dose to the bladder and rectum. Dose distributions about a single colpostat have been extensively measured and calculated. However, these measurements do not consider perturbations from the contralateral colpostat or the intrauterine tandem on the dose distribution. Accurate accounting for all dosimetric effects in brachytherapy is essential for both dose based implant optimization and for comparison with alternate modalities, such as intensity modulated radiation therapy. The authors have used Monte Carlo calculations to evaluate the accuracy of the superposition principle as it applies to both single shielded applicator dose distributions and single source dose distributions. Preliminary analysis indicates differences ranging from 2-5%, warranting further investigation
Keywords :
Monte Carlo methods; cancer; dosimetry; gynaecology; radiation therapy; radioactive sources; Fletcher-Suit-Delclos intracavitary vaginal applicator; W; bladder; contralateral colpostat; dose based implant optimization; dose reduction; gynecological malignancies treatment; intensity modulated radiation therapy; intracavitary vaginal applicators; perturbations; rectum; superposition assumption effect; therapeutic nuclear medicine; tungsten shielding; Applicators; Bladder; Electromagnetic scattering; Geometry; Implants; Intensity modulation; Monte Carlo methods; Particle scattering; Tungsten; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Engineering in Medicine and Biology Society, 2000. Proceedings of the 22nd Annual International Conference of the IEEE
Conference_Location :
Chicago, IL
ISSN :
1094-687X
Print_ISBN :
0-7803-6465-1
Type :
conf
DOI :
10.1109/IEMBS.2000.900756
Filename :
900756
Link To Document :
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