Title :
Extended depth from focus using white light interferometer
Author :
Ryoo, Seok-moon ; Kim, Jae Seon ; Choi, Tae Sun
Author_Institution :
Digital Media Res. Lab., LG Electron. Inc., Seoul, South Korea
Abstract :
A new approach to 3-D profilometry for the white light interferometer (WLI) is presented. We detail a simple way to construct a profiler that uses the fringe contrast degradation of the white light Mirau interferometer. The amount of fringe contrast degradation in the Mirau interferometer can be founded by the depth from focus (DFF) method. In the method, the variance of the mismatch function and the modified local variance function are used as the focus measures. The proposed method is named as the extended depth from focus (EDFF) that determines the zero optical path difference (OPD) from the amount of fringe contrast degradation of the white light interferometer. The method has a theoretically unlimited range and can profile with subpixel accuracy both optically rough and smooth surfaces without changing the algorithm
Keywords :
image reconstruction; image resolution; light interferometry; optical information processing; rough surfaces; 3-D profilometry; DFF method; EDFF; OPD; depth from focus method; extended depth from focus method; fringe contrast degradation; mismatch function; modified local variance function; rough surfaces; smooth surfaces; subpixel accuracy; white light Mirau interferometer; white light interferometer; zero optical path difference; Degradation; Focusing; Optical interferometry; Optical surface waves; Pattern matching; Phase shifting interferometry; Rough surfaces; Sun; Surface roughness; Surface waves;
Conference_Titel :
Image Processing, 2000. Proceedings. 2000 International Conference on
Conference_Location :
Vancouver, BC
Print_ISBN :
0-7803-6297-7
DOI :
10.1109/ICIP.2000.901070