Atom lithography with cold metastable Ne atoms

Summary form only given. We describe experimental results as well as a numerical simulation of atom lithography with a laser cooled metastable Ne beam. The idea of atom lithography as one of the candidates for sub-100 nm lithography is to apply atom optical elements to the creation of nanostructures. In contrast to photolithography, the current industry standard technique, atom lithography is practically not limited by diffraction effects.