Title :
Optimization of waveform shape and frequency in periodic reverse electroplating
Author :
Motieifar, A. ; Khorasani, S. ; Rashidian, B.
Author_Institution :
Dept. of Electr. Eng., Sharif Univ. of Technol., Tehran, Iran
Abstract :
In this report, the time-dependent carrier concentration in electrolytic cells, due to some basic periodic shapes, has been studied. Exact analytical solutions for step, sinusoidal and periodic pulse reverse inputs are derived. The effect of frequency, forward and reverse amplitudes, and pulse modulation width are investigated. Analytical solution of the model is obtained as a Fourier series, using Laplace transformations applied to a one-dimensional model with linearized Butler-Volmer electrode kinetics. The results are applied to an acid-copper bath and discussed. It is shown that there exist optimal operation points or optimal current waveforms to obtain efficient and enhanced deposition processes
Keywords :
Fourier series; Laplace transforms; copper; electric current; electrochemical electrodes; electroplating; integrated circuit interconnections; integrated circuit metallisation; optimisation; pulse modulation; reaction kinetics; semiconductor device metallisation; semiconductor process modelling; 1D model; Cu; Fourier series; Laplace transformations; acid-copper bath; deposition processes; electrolytic cells; forward amplitude effects; frequency effects; linearized Butler-Volmer electrode kinetics; optimal current waveforms; optimal operation points; optimization; periodic pulse reverse inputs; periodic reverse electroplating; periodic shapes; pulse modulation width; reverse amplitude effects; sinusoidal pulse reverse input; step pulse reverse inputs; time-dependent carrier concentration; waveform frequency; waveform shape; Current density; Electrodes; Fabrication; Fourier series; Frequency; Kinetic theory; Micromechanical devices; Pulse modulation; Shape; Voltage;
Conference_Titel :
Microelectronics, 2000. ICM 2000. Proceedings of the 12th International Conference on
Conference_Location :
Tehran
Print_ISBN :
964-360-057-2
DOI :
10.1109/ICM.2000.916472