DocumentCode
1745588
Title
300 mm implant: pilot production at SEMICONDUCTOR300
Author
Zeakes, J.S. ; Franke, D.W. ; Neumann, J. ; Breeden, T.
Author_Institution
SEMICONDUCTOR300, Dresden, Germany
fYear
2000
fDate
2000
Firstpage
360
Lastpage
363
Abstract
This paper presents the history, key results, and current status of two 300 mm ion implant systems used in the pilot production of 64 M DRAM at SEMICONDUCTOR300 in Dresden, Germany. Data from the Axcelis (formerly Eaton SEO) HE-3 and the Varian VIISta 80 is presented. Additional topics include 300 mm automation, maximum beam current production, throughput, and process performance
Keywords
ion implantation; production; semiconductor device manufacture; 300 mm; 64 M DRAM; Axcelis HE-3; Eaton SEO HE-3; SEMICONDUCTOR300; Varian VIISta 80; automation; current status; history; ion implant systems; key results; maximum beam current production; pilot production; process performance; throughput; Automation; Hardware; Helium; Implants; Manufacturing; Payloads; Production; Protection; Safety; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924162
Filename
924162
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