DocumentCode
1745607
Title
Effect of implanted-helium depth profile on damage structures in electron-irradiated stainless steel
Author
Aruga, Takeo ; Katano, Yoshio
Author_Institution
Dept. of Mater. Sci., JAERI, Ibaraki, Japan
fYear
2000
fDate
2000
Firstpage
797
Lastpage
800
Abstract
Cavity formations are completely suppressed in the 316 stainless steel sample irradiated with 1 MeV electrons at 823 K in a high voltage electron microscope after the implantation with 3.0 MeV He ions to 0.3 at.% at peak
Keywords
electron beam effects; ion implantation; stainless steel; transmission electron microscopy; 1 MeV; 3.0 MeV; 316 stainless steel; 823 K; damage structures; electron-irradiated stainless steel; high voltage electron microscope; implanted He depth profile; Building materials; Electron microscopy; Helium; Materials science and technology; Mechanical factors; Microstructure; Nickel; Steel; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology, 2000. Conference on
Conference_Location
Alpbach
Print_ISBN
0-7803-6462-7
Type
conf
DOI
10.1109/.2000.924274
Filename
924274
Link To Document