DocumentCode
174648
Title
Pattern-restricted design at 10nm and beyond
Author
Ghaida, Rani S. ; Badr, Youakim ; Gupta, Puneet
Author_Institution
Technol. Dev. Div., GLOBALFOUNDRIES, Santa Clara, CA, USA
fYear
2014
fDate
19-22 Oct. 2014
Firstpage
308
Lastpage
310
Abstract
Manufacturing has been incapable of keeping up with Moore´s law without significantly increasing process variability and imposing massive geometric restrictions on design. This paper highlights the design impact of variability and geometric constraints - including traditional design rules and pattern-scale constraints - and describes our approach for evaluating and enforcing pattern-scale restrictions on design.
Keywords
integrated circuit design; Moore´s law; geometric constraints; pattern-restricted design; pattern-scale constraints; size 10 nm; Delays; Layout; Manufacturing; Predictive models; Routing; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Design (ICCD), 2014 32nd IEEE International Conference on
Conference_Location
Seoul
Type
conf
DOI
10.1109/ICCD.2014.6974698
Filename
6974698
Link To Document